Invention Grant
- Patent Title: Non-volatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储器件
-
Application No.: US12564576Application Date: 2009-09-22
-
Publication No.: US07933151B2Publication Date: 2011-04-26
- Inventor: Takashi Maeda , Yoshihisa Iwata
- Applicant: Takashi Maeda , Yoshihisa Iwata
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPP2008-291779 20081114
- Main IPC: G11C16/00
- IPC: G11C16/00

Abstract:
Memory strings includes: a first semiconductor layer including a columnar portion extending in a direction perpendicular to a substrate; a first electric charge storage layer formed to surround a side surface of the columnar portion; and a first conductive layer formed to surround the first electric charge storage layer. First selection transistors includes: a second semiconductor layer extending upward from a top surface of the columnar portion; a second electric charge storage layer formed to surround a side surface of the second semiconductor layer; and a second conductive layer formed to surround the second electric charge storage layer. The non-volatile semiconductor storage device further includes a control circuit that causes, prior to reading data from a selected one of the memory strings, electric charges to be accumulated in the second electric charge storage layer of one of the first selection transistors connected to an unselected one of the memory strings.
Public/Granted literature
- US20100124116A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2010-05-20
Information query