Invention Grant
US07935326B2 Method for purification of silica particles, purifier, and purified silica particles
有权
纯化二氧化硅颗粒,净化剂和纯化二氧化硅颗粒的方法
- Patent Title: Method for purification of silica particles, purifier, and purified silica particles
- Patent Title (中): 纯化二氧化硅颗粒,净化剂和纯化二氧化硅颗粒的方法
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Application No.: US11995694Application Date: 2006-10-25
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Publication No.: US07935326B2Publication Date: 2011-05-03
- Inventor: Minoru Kanda , Yoshiyuki Tsuji
- Applicant: Minoru Kanda , Yoshiyuki Tsuji
- Applicant Address: JP Akita-shi
- Assignee: Japan Super Quartz Corporation
- Current Assignee: Japan Super Quartz Corporation
- Current Assignee Address: JP Akita-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-313795 20051028
- International Application: PCT/JP2006/322029 WO 20061025
- International Announcement: WO2007/049811 WO 20070503
- Main IPC: C01B33/12
- IPC: C01B33/12

Abstract:
To provide a treatment method having excellent purification effect, in which impurities having high ionicity in a silica powder can be removed in a short time, a apparatus thereof, and a purified silica powder.A purification method of a silica powder comprises: making a silica powder into a fluid state; contacting a purified gas to the silica powder in the fluid state at high temperature; and thereby removing impurity components of the silica powder. In the method, the silica powder in the fluid state is positioned in a magnetic field region. Further, the silica powder is contacted with the purified gas, while applying voltage to the silica powder by an electric field generated by moving of the silica powder. Preferably, the silica powder in a fluid state is positioned in the magnetic region of 10 gausses or more, and contacted with the purification gas at a temperature of 1000° C. or more.
Public/Granted literature
- US20090257939A1 METHOD FOR PURIFICATION OF SILICA PARTICLES, PURIFIER, AND PURIFIED SILICA PARTICLES Public/Granted day:2009-10-15
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