发明授权
US07942967B2 Method and system of coating polymer solution on a substrate in a solvent saturated chamber
有权
在溶剂饱和室中在基材上涂覆聚合物溶液的方法和系统
- 专利标题: Method and system of coating polymer solution on a substrate in a solvent saturated chamber
- 专利标题(中): 在溶剂饱和室中在基材上涂覆聚合物溶液的方法和系统
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申请号: US11973100申请日: 2007-10-05
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公开(公告)号: US07942967B2公开(公告)日: 2011-05-17
- 发明人: Andrew Nguyen
- 申请人: Andrew Nguyen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Holding N.V.
- 当前专利权人: ASML Holding N.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: B05C11/00
- IPC分类号: B05C11/00 ; B05C11/02 ; B05B1/28
摘要:
A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.
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