Invention Grant
US07943567B2 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
失效
生产工艺和系统,组合物,表面活性剂,单体单元,金属络合物,磷酸酯,二醇,水性成膜泡沫和泡沫稳定剂
- Patent Title: Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
- Patent Title (中): 生产工艺和系统,组合物,表面活性剂,单体单元,金属络合物,磷酸酯,二醇,水性成膜泡沫和泡沫稳定剂
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Application No.: US10587444Application Date: 2005-01-28
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Publication No.: US07943567B2Publication Date: 2011-05-17
- Inventor: Janet Boggs , Stephan Brandstadter , John Chien , Vimal Sharma , E. Bradley Edwards , Vicki Hedrick , Andrew Jackson , Gregory Leman , Edward Norman , Robert Kaufman
- Applicant: Janet Boggs , Stephan Brandstadter , John Chien , Vimal Sharma , E. Bradley Edwards , Vicki Hedrick , Andrew Jackson , Gregory Leman , Edward Norman , Robert Kaufman
- Applicant Address: US DE Wilmington
- Assignee: E.I. du Pont de Nemours and Company
- Current Assignee: E.I. du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Agent Nancy S. Mayer
- International Application: PCT/US2005/003138 WO 20050128
- International Announcement: WO2005/074594 WO 20050818
- Main IPC: C11D1/00
- IPC: C11D1/00 ; C11D3/24 ; C07C17/00 ; C07C19/08 ; C07C21/18 ; C07C22/08

Abstract:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
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