发明授权
- 专利标题: Monolithic semiconductor switches and method for manufacturing
- 专利标题(中): 单片半导体开关及其制造方法
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申请号: US12360263申请日: 2009-01-27
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公开(公告)号: US07943955B2公开(公告)日: 2011-05-17
- 发明人: Oliver Haeberlen , Walter Rieger , Lutz Goergens , Martin Poelzl , Johannes Schoiswohl , Joachim Krumrey
- 申请人: Oliver Haeberlen , Walter Rieger , Lutz Goergens , Martin Poelzl , Johannes Schoiswohl , Joachim Krumrey
- 申请人地址: AT Villach
- 专利权人: Infineon Technologies Austria AG
- 当前专利权人: Infineon Technologies Austria AG
- 当前专利权人地址: AT Villach
- 代理机构: Dicke, Billig & Czaja, PLLC
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
One aspect is monolithic semiconductor switches and method for manufacturing. One embodiment provides one semiconductor die with a first and a second FET. One of source/drain of the first FET and one of source/drain of the second FET are electrically coupled to at least one contact area at a first side of one semiconductor die, respectively. The other one of source/drain of the first FET, a gate of the first FET, the other one of source/drain of the second FET and the gate of the second FET are electrically coupled to contact areas at a second side of the one semiconductor die opposite to the first side, respectively. The contact areas of the other one of source/drain of the first FET, of the gate of the first FET, of the other one of source/drain of the second FET and of the gate of the second FET are electrically separated from each other, respectively.
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