发明授权
US07945870B2 Method and apparatus for detecting lithographic hotspots in a circuit layout
有权
用于在电路布局中检测光刻热点的方法和装置
- 专利标题： Method and apparatus for detecting lithographic hotspots in a circuit layout
- 专利标题（中）： 用于在电路布局中检测光刻热点的方法和装置
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申请号： US11725396申请日： 2007-03-19
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公开(公告)号： US07945870B2公开(公告)日： 2011-05-17
- 发明人: Andrew B. Kahng , Chul-Hong Park , Xu Xu
- 申请人： Andrew B. Kahng , Chul-Hong Park , Xu Xu
- 申请人地址： US CA Oakland
- 专利权人： The Regents of the University of California
- 当前专利权人： The Regents of the University of California
- 当前专利权人地址： US CA Oakland
- 代理机构： Greer, Burns & Crain Ltd.
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
Method for detecting hotspots in a circuit layout includes constructing a layout graph having nodes, corner edges and proximity edges from the circuit layout, converting the layout graph to a corresponding dual graph, and iteratively selecting edges and nodes having weights greater than a predetermined threshold value at each iteration as hotspots.
公开/授权文献
- US20080235645A1 Method and apparatus for detecting lithographic hotspots 公开/授权日：2008-09-25
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