发明授权
US07947639B2 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
有权
含有聚合物腐蚀抑制剂的非水性，非腐蚀性微电子清洗组合物
- 专利标题： Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
- 专利标题（中）： 含有聚合物腐蚀抑制剂的非水性，非腐蚀性微电子清洗组合物
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申请号： US11719690申请日： 2005-02-01
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公开(公告)号： US07947639B2公开(公告)日： 2011-05-24
- 发明人: Seiji Inaoka
- 申请人： Seiji Inaoka
- 申请人地址： US NJ Phillipsburg
- 专利权人： Avantor Performance Materials, Inc.
- 当前专利权人： Avantor Performance Materials, Inc.
- 当前专利权人地址： US NJ Phillipsburg
- 代理机构： Ohlandt, Greeley, Ruggiero & Perle, LLP
- 代理商 George W. Rauchfuss, Jr.
- 国际申请： PCT/US2005/002940 WO 20050201
- 国际公布： WO2006/065256 WO 20060622
- 主分类号： C11D7/26
- IPC分类号： C11D7/26 ; C11D7/32 ; C11D7/34 ; C11D7/50
摘要：
Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone.
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