Invention Grant
- Patent Title: Exposure apparatus, exposure method, and method for producing device
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Application No.: US11896447Application Date: 2007-08-31
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Publication No.: US07947958B2Publication Date: 2011-05-24
- Inventor: Osamu Tanitsu
- Applicant: Osamu Tanitsu
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-338420 20030929; JP2003-344938 20031002; JP2004-042931 20040219
- Main IPC: G01T1/24
- IPC: G01T1/24 ; H01J37/00
Abstract:
A part of exposure beam through a liquid (LQ) via a projection optical system (PL) enters a light-transmitting section (44), enters an optical member (41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
Public/Granted literature
- US08039807B2 Exposure apparatus, exposure method, and method for producing device Public/Granted day:2011-10-18
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