发明授权
- 专利标题: Wafer-to-wafer stacking
- 专利标题(中): 晶圆到晶片堆叠
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申请号: US12180360申请日: 2008-07-25
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公开(公告)号: US07948072B2公开(公告)日: 2011-05-24
- 发明人: Ra-Min Tain , Shu-Ming Chang , Shyi-Ching Liau , Wei-Chung Lo , Rong-Shen Lee , Chi-Shih Chang
- 申请人: Ra-Min Tain , Shu-Ming Chang , Shyi-Ching Liau , Wei-Chung Lo , Rong-Shen Lee , Chi-Shih Chang
- 申请人地址: TW Hsinchu
- 专利权人: Industrial Technology Research Institute
- 当前专利权人: Industrial Technology Research Institute
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
A wafer-to-wafer stacking having a hermetic structure formed therein is provided. The wafer stacking includes a first wafer, including a first substrate and a first device layer having thereon at least one chip and at least one low-k material layer, a second wafer disposed above the first wafer and having a second substrate, and a closed structure disposed on the at least one chip and arranged inside a cutting edge of the at least one chip, wherein the closed structure is extended from one side of the first device layer far from the first substrate to the other side thereof adjacent to the first substrate.
公开/授权文献
- US20100020502A1 Wafer-To-Wafer Stacking 公开/授权日:2010-01-28
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