发明授权
US07948564B2 Programmable mask and method of fabricating biomolecule array using the same
失效
可编程掩模和使用其制造生物分子阵列的方法
- 专利标题： Programmable mask and method of fabricating biomolecule array using the same
- 专利标题（中）： 可编程掩模和使用其制造生物分子阵列的方法
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申请号： US12213244申请日： 2008-06-17
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公开(公告)号： US07948564B2公开(公告)日： 2011-05-24
- 发明人: Moon Youn Jung , Dong Ho Shin , Young Jun Kim , Se Ho Park , Hyeon Bong Pyo , Chang Auck Choi
- 申请人： Moon Youn Jung , Dong Ho Shin , Young Jun Kim , Se Ho Park , Hyeon Bong Pyo , Chang Auck Choi
- 申请人地址： KR Daejeon
- 专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人地址： KR Daejeon
- 代理机构： Lowe Hauptman Ham & Berner LLP
- 优先权： KR2004-61275 20040804
- 主分类号： G02F1/1335
- IPC分类号： G02F1/1335
摘要：
The present invention relates to a programmable mask used in a photolithography process for fabricating a biomolecule array and a method of fabricating a biomolecule array using the same and, more particularly, to a programmable mask which can increase a contrast ratio of transmittance versus shielding of light incident to a liquid crystal which constitutes each pixel by irradiating parallel ultraviolet (“UV”) light generated from an external parallel light exposure device to a certain cell and using a vertically aligned liquid crystal panel or an LC panel having no spacer, and a method of fabricating a biomolecule array using the same.