Invention Grant
- Patent Title: Auto focus of a workpiece using two or more focus parameters
- Patent Title (中): 使用两个或更多对焦参数自动对焦工件
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Application No.: US12247867Application Date: 2008-10-08
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Publication No.: US07948630B2Publication Date: 2011-05-24
- Inventor: Norton Adam , Xinkang Tian
- Applicant: Norton Adam , Xinkang Tian
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agent Manuel B. Madriaga
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
Provided is a method for focusing a workpiece in the Z-axis for optical metrology. The auto focusing subsystem includes a focus detector having a tilt angle, a capture range, and a plurality of sensors. A processor coupled to the focus detector is configured to utilize the plurality of focus signals measured using the focus detector to determine two or more focus parameters. The two or more focus parameters and calibration data are used to determine an initial position of the workpiece and to generate instructions to move the workpiece to a best focus position.
Public/Granted literature
- US20100085576A1 AUTO FOCUS OF A WORKPIECE USING TWO OR MORE FOCUS PARAMETERS Public/Granted day:2010-04-08
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