Invention Grant
US07950809B2 Hologram element, illumination device, projector, and method of manufacturing hologram element
有权
全息元件,照明装置,投影仪及制造全息元件的方法
- Patent Title: Hologram element, illumination device, projector, and method of manufacturing hologram element
- Patent Title (中): 全息元件,照明装置,投影仪及制造全息元件的方法
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Application No.: US12079485Application Date: 2008-03-27
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Publication No.: US07950809B2Publication Date: 2011-05-31
- Inventor: Taisuke Yamauchi , Takashi Takeda , Takahiro Totani
- Applicant: Taisuke Yamauchi , Takashi Takeda , Takahiro Totani
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: AdvantEdge Law Group, LLC
- Priority: JP2007-080869 20070327; JP2008-015876 20080128
- Main IPC: G03B21/14
- IPC: G03B21/14 ; G03H1/22 ; G03H1/02

Abstract:
A hologram element that forms a predetermined illumination pattern on an irradiated surface by diffracting incident light is disclosed. The illumination pattern is formed by making light in a first wavelength region diffracted in a first region, and the illumination pattern is formed by making light in a second wavelength region different from the first wavelength region diffracted in a second region on the same plane as the first region.
Public/Granted literature
- US20080239244A1 Hologram element, illumination device, projector, and method of manufacturing hologram element Public/Granted day:2008-10-02
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