发明授权
- 专利标题: Method of forming a micromagnetic device
- 专利标题(中): 形成微磁装置的方法
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申请号: US11852689申请日: 2007-09-10
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公开(公告)号: US07955868B2公开(公告)日: 2011-06-07
- 发明人: Ashraf W. Lotfi , Trifon M. Liakopoulos , Robert W. Filas , Amrit Panda
- 申请人: Ashraf W. Lotfi , Trifon M. Liakopoulos , Robert W. Filas , Amrit Panda
- 申请人地址: US NJ Hampton
- 专利权人: Enpirion, Inc.
- 当前专利权人: Enpirion, Inc.
- 当前专利权人地址: US NJ Hampton
- 代理机构: Slater & Matsil, L.L.P.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method of forming a micromagnetic device on a substrate including forming a first insulating layer above the substrate, a first seed layer above the first insulating layer, a first conductive winding layer above the first seed layer, and a second insulating layer above the first conductive winding layer. The method also includes forming a first magnetic core layer above the second insulating layer, a third insulating layer above the first magnetic core layer, and a second magnetic core layer above the third insulating layer. The method still further includes forming a fourth insulating layer above the second magnetic core layer, a second seed layer above the fourth insulating layer, and a second conductive winding layer above the second seed layer and in vias to the first conductive winding layer. The first and second conductive winding layers form a winding for the micromagnetic device.
公开/授权文献
- US20090068761A1 Method of Forming a Micromagnetic Device 公开/授权日:2009-03-12
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