发明授权
US07955954B2 Method of making semiconductor devices employing first and second carriers
有权
制造采用第一和第二载体的半导体器件的方法
- 专利标题: Method of making semiconductor devices employing first and second carriers
- 专利标题(中): 制造采用第一和第二载体的半导体器件的方法
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申请号: US12102175申请日: 2008-04-14
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公开(公告)号: US07955954B2公开(公告)日: 2011-06-07
- 发明人: Stefan Landau , Joachim Mahler , Thomas Wowra
- 申请人: Stefan Landau , Joachim Mahler , Thomas Wowra
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Dicke, Billig & Czaja, PLLC
- 主分类号: H01L21/301
- IPC分类号: H01L21/301
摘要:
A semiconductor device and method. One embodiment provides an integral array of first carriers and an integral array of second carries connected to the integral array of first carriers. First semiconductor chips are arranged on the integral array of first carriers. The integral array of second carriers is arranged over the first semiconductor chips.
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