Invention Grant
- Patent Title: Phase change material for use in a phase change random access memory, the phase change material having uniformly distributed insulating impurities
- Patent Title (中): 用于相变随机存取存储器的相变材料,相变材料具有均匀分布的绝缘杂质
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Application No.: US11498796Application Date: 2006-08-04
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Publication No.: US07956342B2Publication Date: 2011-06-07
- Inventor: Jin-seo Noh , Yoon-ho Khang , Sang-mock Lee , Dong-seok Suh
- Applicant: Jin-seo Noh , Yoon-ho Khang , Sang-mock Lee , Dong-seok Suh
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2005-0071482 20050804
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L29/12

Abstract:
Insulating impurities may be uniformly distributed over an entire or partial region of the phase change material. The PRAM may include a phase change layer including the phase change material. The insulating impurity content of the phase change material may be 0.1 to 10% (inclusive) the volume of the phase change material. The insulating impurity content of the phase change material may be adjusted by controlling the power applied to a target including the insulating impurities.
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