Invention Grant
- Patent Title: Phase change memory devices and methods for manufacturing the same
- Patent Title (中): 相变存储器件及其制造方法
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Application No.: US12056227Application Date: 2008-03-26
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Publication No.: US07964862B2Publication Date: 2011-06-21
- Inventor: Frederick T Chen , Yen Chuo , Hong-Hui Hsu , Jyi-Tyan Yeh , Ming-Jinn Tsai
- Applicant: Frederick T Chen , Yen Chuo , Hong-Hui Hsu , Jyi-Tyan Yeh , Ming-Jinn Tsai
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW96114371A 20070424
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
Phase change memory devices and methods for manufacturing the same are provided. An exemplary embodiment of a phase change memory device includes a first electrode disposed in a first dielectric layer. A second dielectric layer is disposed over the first dielectric layer and the first electrode. A phase change material layer disposed in the second dielectric layer to electrically contact the first electrode. A third dielectric layer is disposed over the second dielectric layer. A second electrode is disposed in the third dielectric layer to electrically connect the phase change material layer and at least one gap disposed in the first dielectric layer or the second dielectric layer to thereby isolate portions of the phase change material layer and portions of the first or second dielectric layer adjacent thereto.
Public/Granted literature
- US20080265238A1 PHASE CHANGE MEMORY DEVICES AND METHODS FOR MANUFACTURING THE SAME Public/Granted day:2008-10-30
Information query
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