Invention Grant
- Patent Title: Nano imprint master and method of manufacturing the same
- Patent Title (中): 纳米印记的主人和制造方法相同
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Application No.: US11745609Application Date: 2007-05-08
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Publication No.: US07968253B2Publication Date: 2011-06-28
- Inventor: Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
- Applicant: Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2006-0055538 20060620; KR10-2006-0125657 20061211
- Main IPC: G03F1/00
- IPC: G03F1/00

Abstract:
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
Public/Granted literature
- US20070292773A1 NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2007-12-20
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