发明授权
- 专利标题: Laser processing apparatus and laser processing method
- 专利标题(中): 激光加工设备和激光加工方法
-
申请号: US11598653申请日: 2006-11-14
-
公开(公告)号: US07968432B2公开(公告)日: 2011-06-28
- 发明人: Muneo Tamura , Tetsuo Fujii
- 申请人: Muneo Tamura , Tetsuo Fujii
- 申请人地址: JP Kariya
- 专利权人: DENSO CORPORATION
- 当前专利权人: DENSO CORPORATION
- 当前专利权人地址: JP Kariya
- 代理机构: Posz Law Group, PLC
- 优先权: JP2005-331220 20051116; JP2005-331222 20051116
- 主分类号: H01L21/76
- IPC分类号: H01L21/76
摘要:
A laser processing apparatus has one laser light source that simultaneously radiates laser beams with two wavelengths. Depth positions of focusing points for laser beams are gradually changed in a wafer. Three sets of modifying region groups, i.e., six layers of modifying region groups, are successively formed. One set of modifying region groups constitutes two layers and is formed at a time. The modifying region groups are separated, adjoined, or overlapped with each other along an estimated cut line of the wafer in a depth direction from a surface thereof.
公开/授权文献
- US20070202619A1 Laser processing apparatus and laser processing method 公开/授权日:2007-08-30
信息查询
IPC分类: