发明授权
- 专利标题: Solid-state image sensor and manufacturing method thereof
- 专利标题(中): 固态图像传感器及其制造方法
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申请号: US11422708申请日: 2006-06-07
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公开(公告)号: US07968888B2公开(公告)日: 2011-06-28
- 发明人: Takumi Yamaguchi , Takahiko Murata , Shigetaka Kasuga
- 申请人: Takumi Yamaguchi , Takahiko Murata , Shigetaka Kasuga
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: Greenblum & Bernstein, P.L.C.
- 优先权: JP2005-168701 20050608; JP2005-168724 20050608; JP2005-168725 20050608; JP2005-168726 20050608
- 主分类号: H01L31/00
- IPC分类号: H01L31/00
摘要:
An object of the present invention is to provide a small solid-state image sensor which realizes significant improvement in sensitivity. The solid-state image sensor of the present invention includes a semiconductor substrate in which photoelectric conversion units are formed, a light-blocking film which is formed above the semiconductor substrate and has apertures formed so as to be positioned above respective photoelectric conversion units, and a high refractive index layer formed in the apertures. Here, each aperture has a smaller aperture width than a maximum wavelength in a wavelength of light in a vacuum converted from a wavelength of the light entering the photoelectric conversion unit through the apertures, and the high refractive index is made of a high refractive index material having a refractive index which allows transmission of light having the maximum wavelength through the aperture.
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