Invention Grant
- Patent Title: High-frequency bipolar transistor and method for the production thereof
- Patent Title (中): 高频双极晶体管及其制造方法
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Application No.: US12716692Application Date: 2010-03-03
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Publication No.: US07968972B2Publication Date: 2011-06-28
- Inventor: Josef Böck , Thomas Meister , Reinhard Stengl , Herbert Schäfer
- Applicant: Josef Böck , Thomas Meister , Reinhard Stengl , Herbert Schäfer
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Brinks Hofer Gilson & Lione
- Priority: DE10318422 20030423
- Main IPC: H01L29/73
- IPC: H01L29/73

Abstract:
A high-frequency bipolar transistor includes an emitter contact adjoining an emitter connection region, a base contact adjoining a base connection region, and a collector contact adjoining a collector connection region. A first insulation layer is disposed on the base connection region. The collector connection region contains a buried layer, which connects the collector contact to a collector zone. A silicide or salicide region is provided on the buried layer and connects the collector contact to the collector zone in a low-impedance manner. A second insulation layer is disposed on the collector connection region but not on the silicide region.
Public/Granted literature
- US20100155896A1 HIGH-FREQUENCY BIPOLAR TRANSISTOR AND METHOD FOR THE PRODUCTION THEREOF Public/Granted day:2010-06-24
Information query
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