Invention Grant
- Patent Title: Semiconductor device fabricating system
- Patent Title (中): 半导体器件制造系统
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Application No.: US11889615Application Date: 2007-08-15
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Publication No.: US07972468B2Publication Date: 2011-07-05
- Inventor: Yuji Kamikawa , Masahiro Noda
- Applicant: Yuji Kamikawa , Masahiro Noda
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-222401 20060817
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C23C16/00

Abstract:
A semiconductor device fabricating system 1 includes a casing 10, processing units 12, 13 and 14, for carrying out semiconductor device fabricating processes, disposed inside the casing, and platforms 15, 16 and 17 set outside the casing. The platforms are foldable. Spaces required by the platforms can be reduced and the footprint of the semiconductor device fabricating system can be reduced by folding the platforms.
Public/Granted literature
- US20080041525A1 Semiconductor device fabricating system Public/Granted day:2008-02-21
Information query
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