Invention Grant
- Patent Title: Method for imparting hydrogen resistance to articles
- Patent Title (中): 赋予制品耐氢性的方法
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Application No.: US11578404Application Date: 2005-04-15
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Publication No.: US07972491B2Publication Date: 2011-07-05
- Inventor: Toshinobu Niinae
- Applicant: Toshinobu Niinae
- Applicant Address: JP Tokyo
- Assignee: Hitachi Metals, Ltd.
- Current Assignee: Hitachi Metals, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2004-119959 20040415; JP2004-252038 20040831
- International Application: PCT/JP2005/007309 WO 20050415
- International Announcement: WO2005/100641 WO 20051027
- Main IPC: C25D3/38
- IPC: C25D3/38 ; C25D3/02 ; C25D5/48
Abstract:
A simple and low cost method for imparting excellent hydrogen resistance to various types of articles such as a rare earth metal-based permanent magnet. A method for imparting hydrogen resistance to an article of the present invention is characterized by forming a metal coating film by pulse plating on the surface of the article.
Public/Granted literature
- US20080131708A1 Method for Imparting Hydrogen Resistance to Articles Public/Granted day:2008-06-05
Information query
