发明授权
- 专利标题: Microresonator systems and methods of fabricating the same
- 专利标题(中): 微谐振器系统及其制造方法
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申请号: US12479604申请日: 2009-06-05
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公开(公告)号: US07972882B2公开(公告)日: 2011-07-05
- 发明人: Michael Renne Ty Tan , Shih-Yuan Wang , Duncan Stewart , David A. Fattal
- 申请人: Michael Renne Ty Tan , Shih-Yuan Wang , Duncan Stewart , David A. Fattal
- 申请人地址: US TX Houston
- 专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人地址: US TX Houston
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Various embodiments of the present invention are related to microresonator systems and to methods for fabricating the microresonator systems. In one embodiment, a method of fabricating a microresonator system comprises: forming a multilayer system having a bottom layer, a top layer, and an intermediate layer having one or more quantum wells and sandwiched between the bottom layer and the top layer; embedding at least one waveguide in a substrate having a top surface, the at least one waveguide positioned adjacent to the top surface of the substrate; wafer bonding the top layer of the multilayer system to the top surface of the substrate; forming a microresonator in the multilayer system, wherein at least a portion of a peripheral annular region of the microresonator is portioned above the at least one waveguide; and forming a current isolation region in at least a portion of a central region of the microresonator.
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