Invention Grant
- Patent Title: Method of manufacturing photoelectric device
- Patent Title (中): 制造光电器件的方法
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Application No.: US12400674Application Date: 2009-03-09
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Publication No.: US07972883B2Publication Date: 2011-07-05
- Inventor: Seung-Jae Jung , Byoung-June Kim , Jin-Seock Kim , Czang-Ho Lee , Myung-Hun Shin , Joon-Young Seo , Dong-Uk Choi , Byoung-Kyu Lee
- Applicant: Seung-Jae Jung , Byoung-June Kim , Jin-Seock Kim , Czang-Ho Lee , Myung-Hun Shin , Joon-Young Seo , Dong-Uk Choi , Byoung-Kyu Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2008-0023490 20080313
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
In a method of manufacturing a photoelectric device, a transparent conductive layer is formed on a substrate, and the transparent conductive layer is partially etched using an etching solution including hydrofluoric acid. Thus, a transparent electrode having a concavo-convex pattern on its surface is formed. When the transparent conductive layer is partially etched, a haze of the transparent electrode may be controlled by adjusting an etching time of the transparent conductive layer. Also, since the etching solution is sprayed to the transparent conductive layer to etch the transparent conductive layer, the concavo-convex pattern on the surface of the transparent electrode may be easily formed even though the size of the substrate increases.
Public/Granted literature
- US20090233399A1 METHOD OF MANUFACTURING PHOTOELECTRIC DEVICE Public/Granted day:2009-09-17
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