发明授权
- 专利标题: Methodology for assessing degradation due to radio frequency excitation of transistors
- 专利标题(中): 评估由于晶体管射频激发引起的退化的方法
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申请号: US12013221申请日: 2008-01-11
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公开(公告)号: US07974595B2公开(公告)日: 2011-07-05
- 发明人: Vijay Kumar Reddy , Andrew Marshall , Siraj Akhtar , Srikanth Krishnan , Karan Singh Bhatia
- 申请人: Vijay Kumar Reddy , Andrew Marshall , Siraj Akhtar , Srikanth Krishnan , Karan Singh Bhatia
- 申请人地址: US TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: US TX Dallas
- 代理商 Warren L. Franz; Wade J. Brady, III; Frederick J. Telecky, Jr.
- 主分类号: H04B17/00
- IPC分类号: H04B17/00 ; H03C1/62
摘要:
One embodiment relates to an on-chip power amplifier (PA) test circuit. In one embodiment, a PA test circuit comprises a controllable oscillator (CO) configured to generate a radio frequency (RF) signal, a parallel resonant circuit tuned to the radio frequency, a pre-power amplifier (PPA) coupled to the CO and the parallel resonant circuit, the PPA configured to amplify and drive the RF signal from an output of the PPA into a load. The test circuit may further comprise a first transmission gate configured to couple the RF signal from the CO to an input of the PPA. One testing methodology for a PA test circuit comprises stressing the PPA with an RF signal, measuring a characteristic of the PPA, determining stress degradation from the characteristic measurements, and repeating the stressing and characteristic measurements until a maximum stress degradation is achieved or a maximum stress has been applied.
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