发明授权
- 专利标题: Photomultiplier and its manufacturing method
- 专利标题(中): 光电倍增管及其制造方法
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申请号: US10589602申请日: 2005-02-16
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公开(公告)号: US07977878B2公开(公告)日: 2011-07-12
- 发明人: Hiroyuki Kyushima , Hideki Shimoi , Akihiro Kageyama , Keisuke Inoue , Masuo Ito
- 申请人: Hiroyuki Kyushima , Hideki Shimoi , Akihiro Kageyama , Keisuke Inoue , Masuo Ito
- 申请人地址: JP Hamamatsu-shi, Shizuoka
- 专利权人: Hamamatsu Photonics K.K.
- 当前专利权人: Hamamatsu Photonics K.K.
- 当前专利权人地址: JP Hamamatsu-shi, Shizuoka
- 代理机构: Drinker Biddle & Reath LLP
- 优先权: JPP2004-040405 20040217
- 国际申请: PCT/JP2005/002298 WO 20050216
- 国际公布: WO2005/078760 WO 20050825
- 主分类号: H01J43/20
- IPC分类号: H01J43/20 ; H01J43/26
摘要:
The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
公开/授权文献
- US20070194713A1 Photomultiplier and its manufacturing method 公开/授权日:2007-08-23
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