Invention Grant
- Patent Title: Photomultiplier and its manufacturing method
- Patent Title (中): 光电倍增管及其制造方法
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Application No.: US10589602Application Date: 2005-02-16
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Publication No.: US07977878B2Publication Date: 2011-07-12
- Inventor: Hiroyuki Kyushima , Hideki Shimoi , Akihiro Kageyama , Keisuke Inoue , Masuo Ito
- Applicant: Hiroyuki Kyushima , Hideki Shimoi , Akihiro Kageyama , Keisuke Inoue , Masuo Ito
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JPP2004-040405 20040217
- International Application: PCT/JP2005/002298 WO 20050216
- International Announcement: WO2005/078760 WO 20050825
- Main IPC: H01J43/20
- IPC: H01J43/20 ; H01J43/26

Abstract:
The present invention relates to a photomultiplier having a structure for making it possible to easily realize high detection accuracy and fine processing, and a method of manufacturing the same. The photomultiplier comprises an enclosure having an inside kept in a vacuum state, whereas a photocathode emitting electrons in response to incident light, an electron multiplier section multiplying in a cascading manner the electron emitted from the photocathode, and an anode for taking out a secondary electron generated in the electron multiplier section are arranged in the enclosure. A part of the enclosure is constructed by a glass substrate having a flat part, whereas each of the electron multiplier section and anode is two-dimensionally arranged on the flat part in the glass substrate.
Public/Granted literature
- US20070194713A1 Photomultiplier and its manufacturing method Public/Granted day:2007-08-23
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