发明授权
- 专利标题： Method for manufacturing a self-aligned full side shield PMR
- 专利标题（中）： 制造自对准全侧护罩PMR的方法
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申请号： US11728910申请日： 2007-03-27
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公开(公告)号： US07979978B2公开(公告)日： 2011-07-19
- 发明人: Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
- 申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
- 申请人地址： US CA Milpitas
- 专利权人： Headway Technologies, Inc.
- 当前专利权人： Headway Technologies, Inc.
- 当前专利权人地址： US CA Milpitas
- 代理机构： Saile Ackerman LLC
- 代理商 Stephen B. Ackerman
- 主分类号： G11B5/187
- IPC分类号： G11B5/187
摘要：
A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.
公开/授权文献
- US20080253035A1 Self-aligned full side shield PMR and method to make it 公开/授权日：2008-10-16