发明授权
- 专利标题： Gamma ray-sensitive phthalocyanine compound of poly cross-linking type and ink composition comprising the same
- 专利标题（中）： 聚交联型γ射线敏感性酞菁化合物和包含其的油墨组合物
-
申请号： US12112418申请日： 2008-04-30
-
公开(公告)号： US07981208B2公开(公告)日： 2011-07-19
- 发明人: Shi Surk Kim , Kyung Mi Lee , Ku Won Seo , Sang Geun Lee , Won Gyun Choe , Sun Hong Yoon , Soo Dong Kim
- 申请人： Shi Surk Kim , Kyung Mi Lee , Ku Won Seo , Sang Geun Lee , Won Gyun Choe , Sun Hong Yoon , Soo Dong Kim
- 申请人地址： KR KR
- 专利权人： Nanocms Co., Ltd.,Korea Minting and Security Printing Corp.
- 当前专利权人： Nanocms Co., Ltd.,Korea Minting and Security Printing Corp.
- 当前专利权人地址： KR KR
- 代理机构： Park & Associates IP Law, P.C.
- 优先权： KR10-2007-0042163 20070430
- 主分类号： C09D11/02
- IPC分类号： C09D11/02 ; C09B47/04
摘要：
The present invention relates to phthalocyanine compound of poly cross-linking type which is represented with the below formula 1 and is useful for preventing forgery and alternation due to a rapid velocity being responded to a gamma ray of Neutron, and an ink composition comprising it. wherein, M1 and M2 are any one selected from a group consisted of a metal, a metal oxide or a metal halide respectively and may be same or different, R is a hydrogen atom, a halogen atom, a hydroxyl group, an amino group, a hydroxysulfonyl group, an aminosulfonyl group, or an alky group having a substituent group having from 1 to 20 carbon atoms, and n is an integer of 0˜3.