发明授权
- 专利标题: Particle beam irradiation system
- 专利标题(中): 粒子束照射系统
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申请号: US12493379申请日: 2009-06-29
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公开(公告)号: US07982198B2公开(公告)日: 2011-07-19
- 发明人: Hideaki Nishiuchi , Kazuyoshi Saito
- 申请人: Hideaki Nishiuchi , Kazuyoshi Saito
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, PC
- 优先权: JP2006-089840 20060329
- 主分类号: A61N5/00
- IPC分类号: A61N5/00
摘要:
It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
公开/授权文献
- US20090283704A1 PARTICLE BEAM IRRADIATION SYSTEM 公开/授权日:2009-11-19
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