Invention Grant
- Patent Title: Pattern recognition system, pattern recognition method, and pattern recognition program
- Patent Title (中): 模式识别系统,模式识别方法和模式识别程序
-
Application No.: US12831711Application Date: 2010-07-07
-
Publication No.: US07983484B2Publication Date: 2011-07-19
- Inventor: Lei Huang
- Applicant: Lei Huang
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP2004-008533 20040115
- Main IPC: G06K9/46
- IPC: G06K9/46 ; G06K9/72

Abstract:
A pattern recognition system, pattern recognition method, and pattern recognition program capable of increasing the accuracy in computing the false acceptance probability and capable of ensuring a stable security strength are provided. Pattern recognition systems 10 and 10a comprise a first probability computation unit 32, and a second probability computation unit 33 coupled to the first probability computation unit 32. The first probability computation unit 32 computes a first probability PFCR based on the number n of corresponding characteristic points cs1 to csn and cf1 to cfn indicating points corresponding between characteristic points s1 to sns in a first pattern and characteristic points f1 to fnf in a second pattern. The first probability PFCR indicates the probability of existence of a third pattern that has a greater number of corresponding characteristic points to the first pattern than the number n of the corresponding characteristic points. The second probability computation unit 33 refers to the first probability PFCR to compute a false acceptance probability PFAR indicating the probability of falsely determining that the first pattern and the second pattern correspond to each other.
Public/Granted literature
- US20100272371A1 PATTERN RECOGNITION SYSTEM, PATTERN RECOGNITION METHOD, AND PATTERN RECOGNITION PROGRAM Public/Granted day:2010-10-28
Information query