发明授权
- 专利标题: Afocal attachment for projection lens
- 专利标题(中): 投影镜头附近
-
申请号: US12244032申请日: 2008-10-02
-
公开(公告)号: US07988306B2公开(公告)日: 2011-08-02
- 发明人: Joseph R. Bietry , Barry D. Silverstein
- 申请人: Joseph R. Bietry , Barry D. Silverstein
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 主分类号: G03B21/14
- IPC分类号: G03B21/14 ; G03B21/28 ; G02B3/00 ; G02B15/14 ; G02B17/00 ; G02B13/00 ; H04N5/74
摘要:
A projection apparatus has a spatial light modulator to modulate illumination from a laser light source. A base projection lens has, from its long conjugate side to its short conjugate side, a first lens group with negative focal length and with a first lens element that has a negative focal length and a second lens element of positive focal length, a second lens group of negative focal length and spaced apart from the first lens group and having one or more cemented lens elements, and a third lens group spaced apart from the second lens group and having a lens with a positive focal length. The base projection lens has a first field of view and is telecentric in its short conjugate. An afocal attachment to the base projection lens alters the first field of view by the same amount in both of two orthogonal directions.
公开/授权文献
- US20100085993A1 AFOCAL ATTACHMENT FOR PROJECTION LENS 公开/授权日:2010-04-08
信息查询