Invention Grant
- Patent Title: Chemical liquid supply system
- Patent Title (中): 化学液体供应系统
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Application No.: US11659727Application Date: 2005-07-29
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Publication No.: US07988429B2Publication Date: 2011-08-02
- Inventor: Katsuya Okumura , Shigenobu Itoh , Tetsuya Toyoda , Kazuhiro Sugata
- Applicant: Katsuya Okumura , Shigenobu Itoh , Tetsuya Toyoda , Kazuhiro Sugata
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Octec Inc.,Tokyo Electron Limited
- Current Assignee: Octec Inc.,Tokyo Electron Limited
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2004-232071 20040809
- International Application: PCT/JP2005/013919 WO 20050729
- International Announcement: WO2006/016486 WO 20060216
- Main IPC: B65D37/00
- IPC: B65D37/00 ; B65D83/00

Abstract:
A chemical liquid supply system that prevents the generation of heat during operation in a pump and allows downsizing the discharge pump for instilling a chemical liquid from a tip nozzle. Compressed air is supplied to an upper space of a resist bottle and the chemical liquid is conferred positive pressure and sent out to a pump chamber of a discharge pump, thereby the pump chamber is filled with a resist liquid. This eliminates the need of a conventional construction where a spring or others are used to drive a flexible membrane of the discharge pump to the operation chamber side to take in the resist liquid. As a result, no electric motor is used, so there is obviously no risk of heat damage to a semiconductor wafer and the discharge pump itself can be further downsized.
Public/Granted literature
- US20070267065A1 Chemical Liquid Supply System Public/Granted day:2007-11-22
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