Invention Grant
US07989263B2 Method for manufacturing a micromechanical chip and a component having a chip of this type 有权
用于制造微机械芯片的方法和具有这种类型的芯片的部件

Method for manufacturing a micromechanical chip and a component having a chip of this type
Abstract:
In a method for manufacturing a micromechanical chip, a sacrificial layer and an epitaxy layer are initially applied to a semiconductor substrate to produce a layer stack. An opening is subsequently introduced into the epitaxy layer from the front side of the layer stack. In order to electrically insulate the subsequent filling of the opening using a conductive contact layer from the material of the epitaxy layer, the walls of the opening are provided with an insulating layer. For removing the sacrificial layer and thus for producing the chip, separation trenches are subsequently etched through the epitaxy layer to the sacrificial layer also from the front side of the layer stack, which separation trenches also delimit the lateral extension of the chip.
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