发明授权
- 专利标题: Image sensor and method for manufacturing the same
- 专利标题(中): 图像传感器及其制造方法
-
申请号: US12001650申请日: 2007-12-11
-
公开(公告)号: US07989908B2公开(公告)日: 2011-08-02
- 发明人: Seoung Hyun Kim
- 申请人: Seoung Hyun Kim
- 申请人地址: KR Seoul
- 专利权人: Dongbu HiTek Co., Ltd.
- 当前专利权人: Dongbu HiTek Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: The Law Offices of Andrew D. Fortney
- 代理商 Andrew D. Fortney
- 优先权: KR10-2006-0134766 20061227
- 主分类号: H01L31/00
- IPC分类号: H01L31/00 ; H01L31/0232
摘要:
Provided is an image sensor. The image sensor includes a semiconductor substrate, photodiode structures, color filters, and microlenses. The semiconductor substrate includes a first region having pixel regions and a second region around the first region. The pixel regions are arranged in a matrix configuration. Each of the photodiode structures has a photodiode in each of the pixel regions. The color filters are disposed on or over the photodiode structures, the color filters correspond to the pixel regions, respectively, and have different areas corresponding to incident angles of light.
公开/授权文献
- US20080157087A1 Image sensor and method for manufacturing the same 公开/授权日:2008-07-03
信息查询
IPC分类: