发明授权
US07991214B1 Method to enhance X-ray and optical images and locate nano-scale cracks in electric devices and components
有权
增强X射线和光学图像并定位电气设备和部件中的纳米尺度裂纹的方法
- 专利标题： Method to enhance X-ray and optical images and locate nano-scale cracks in electric devices and components
- 专利标题（中）： 增强X射线和光学图像并定位电气设备和部件中的纳米尺度裂纹的方法
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申请号： US11737026申请日： 2007-04-18
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公开(公告)号： US07991214B1公开(公告)日： 2011-08-02
- 发明人: Jae H. Choi , James E. Evans , Matthew Gilhousen , Mark D. Woolley
- 申请人： Jae H. Choi , James E. Evans , Matthew Gilhousen , Mark D. Woolley
- 申请人地址： US NJ Basking Ridge
- 专利权人： Avaya Inc.
- 当前专利权人： Avaya Inc.
- 当前专利权人地址： US NJ Basking Ridge
- 代理机构： Sheridan Ross P.C.
- 主分类号： G06K9/00
- IPC分类号： G06K9/00
摘要：
The present invention provides an image enhancer that can be applied to various materials during quality testing. The image enhancer is adapted to infiltrate cracks, crevices, fractures, fissures, and other faults, defects, or flaws in the material and provide an increased contrast for images taken by, for example, an X-ray imaging device.
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