Invention Grant
- Patent Title: Via antenna fix in deep sub-micron circuit designs
- Patent Title (中): 通过天线固定在深亚微米电路设计中
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Application No.: US11828515Application Date: 2007-07-26
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Publication No.: US07994543B2Publication Date: 2011-08-09
- Inventor: Yi Wu , Kenan Yu
- Applicant: Yi Wu , Kenan Yu
- Applicant Address: US CA Redwood City
- Assignee: Oracle America, Inc.
- Current Assignee: Oracle America, Inc.
- Current Assignee Address: US CA Redwood City
- Agency: Polsinelli Shughart PC
- Main IPC: H01L27/10
- IPC: H01L27/10 ; H01L29/73

Abstract:
A filler cell for use in fabricating an integrated circuit. The filler cell couples a power supply rail of an adjacent logic cell to a power supply rail of another adjacent logic cell. The filler cell also has a diode to bleed charge accumulated on the power rails of the adjacent logic cells to the substrate. The diode is reverse biased during normal integrated circuit operation. A method for fabricating an integrated circuit with a power grid. At least one filler cell is placed on the integrated circuit to bleed away charge accumulated on the power grid during the fabrication of the integrated circuit. The filler cell is connected to a supply rail of an adjacent logic cell.
Public/Granted literature
- US20090026502A1 VIA ANTENNA FIX IN DEEP SUB-MICRON CIRCUIT DESIGNS Public/Granted day:2009-01-29
Information query
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