发明授权
- 专利标题: Spin transistor using perpendicular magnetization
- 专利标题(中): 旋转晶体管使用垂直磁化
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申请号: US11949659申请日: 2007-12-03
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公开(公告)号: US07994555B2公开(公告)日: 2011-08-09
- 发明人: Hyun-Cheol Koo , Suk-Hee Han , Joon-Yeon Chang , Hyung-Jun Kim , Jin-Seock Ma
- 申请人: Hyun-Cheol Koo , Suk-Hee Han , Joon-Yeon Chang , Hyung-Jun Kim , Jin-Seock Ma
- 申请人地址: KR
- 专利权人: Korea Institute of Science and Technology
- 当前专利权人: Korea Institute of Science and Technology
- 当前专利权人地址: KR
- 代理机构: Wells St. John P.S.
- 优先权: KR10-2007-0058532 20070614
- 主分类号: H01L29/76
- IPC分类号: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119
摘要:
A spin transistor useful for device miniaturization and high-density integration is provided. The spin transistor includes: a semiconductor substrate including a channel layer; ferromagnetic source and drain disposed on the semiconductor substrate to be separated from each other and to be magnetized in a direction perpendicular to a surface of the channel layer; a gate formed on the semiconductor substrate between the source and the drain to adjust spins of electrons passing through the channel layer, wherein spin-polarized electrons are injected from the source to the channel layer, and the electrons injected into the channel layer pass though the channel layer and are injected into the drain, and wherein the spins of the electrons passing through the channel layer undergo precession due to a spin-orbit coupling induced magnetic field according to a voltage of the gate.
公开/授权文献
- US20080308844A1 Spin Transistor Using Perpendicular Magnetization 公开/授权日:2008-12-18
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