发明授权
- 专利标题: Device and method for lithography
- 专利标题(中): 光刻设备和方法
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申请号: US11905036申请日: 2007-09-27
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公开(公告)号: US07997890B2公开(公告)日: 2011-08-16
- 发明人: Babak Heidari , Marc Beck
- 申请人: Babak Heidari , Marc Beck
- 申请人地址: SE Malmo
- 专利权人: Obducat AB
- 当前专利权人: Obducat AB
- 当前专利权人地址: SE Malmo
- 代理机构: Renner, Otto, Boisselle & Sklar, LLP
- 优先权: EP04445057 20040507
- 主分类号: B29C59/00
- IPC分类号: B29C59/00 ; B28B17/00 ; B29B13/08
摘要:
Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).
公开/授权文献
- US20080030700A1 Device and method for lithography 公开/授权日:2008-02-07
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