A method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks results in a master mold having topographic pillars arranged in a pattern of annular bands of concentric rings. The ratio of circumferential density of the pillars to the radial density of the concentric rings in a band is greater than 1. The method uses sidewall lithography to first form a pattern of generally radially-directed pairs of parallel lines on the master mold substrate, with the lines being grouped into annular zones or bands. The sidewall lithography process can be repeated, resulting in a doubling of the number of lines each time the process is repeated. Conventional lithography is used to form concentric rings over the radially-directed pairs of parallel lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands. The master mold may be used to nanoimprint the disks, resulting in disks having a BAR greater than 1, wherein BAR is the ratio of data track spacing in the radial direction to the data island spacing in the circumferential direction.