发明授权
US08003299B2 Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method
有权
用于凸版印刷的感光原版印刷版,凸版印刷版的制造方法和用于进行该方法的遮光油墨
- 专利标题: Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method
- 专利标题(中): 用于凸版印刷的感光原版印刷版,凸版印刷版的制造方法和用于进行该方法的遮光油墨
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申请号: US11587506申请日: 2005-04-25
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公开(公告)号: US08003299B2公开(公告)日: 2011-08-23
- 发明人: Toshiya Takagi , Takashi Fujimoto , Tadahiko Tabe
- 申请人: Toshiya Takagi , Takashi Fujimoto , Tadahiko Tabe
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 优先权: JP2004-136720 20040430
- 国际申请: PCT/JP2005/008329 WO 20050425
- 国际公布: WO2005/106585 WO 20051110
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; G03F7/26
摘要:
Provided are an original printing plate for relief printing that solves both the problems of the prior-art negative film or its alternatives, and problems of mask pattern formation directly on the surface of the photosensitive resin layer by an ink composition, as well as a method for forming an relief printing plate using the same. Employing a photosensitive original printing plate for relief printing including a support substrate (A); a photosensitive resin layer (B) provided thereon and having a photosensitivity to light in a predetermined wavelength region; and an ink holding layer (C) provided thereon; wherein the layer (C) is capable of retaining a light-shielding ink, and capable of constituting a light-shielding pattern inside the layer (C), the light-shielding pattern being formed by applying the light-shielding ink to the (C) in accordance with the pattern; and wherein the (C) at the area to which the light-shielding ink is not applied is substantially transparent to the light in the predetermined wavelength region.
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