发明授权
- 专利标题： Focused-beam ellipsometer
- 专利标题（中）： 聚焦光椭圆仪
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申请号： US12308662申请日： 2007-06-20
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公开(公告)号： US08004677B2公开(公告)日： 2011-08-23
- 发明人: Joong Whan Lee , Young June Ko , Young Sun Park , Yoon Jong Park , Chi Woon Jeong , Sang Heon Ye , Yong Jai Cho , Hyun Mo Cho , Won Chegal
- 申请人： Joong Whan Lee , Young June Ko , Young Sun Park , Yoon Jong Park , Chi Woon Jeong , Sang Heon Ye , Yong Jai Cho , Hyun Mo Cho , Won Chegal
- 申请人地址： KR Daejeon KR Daejeon
- 专利权人： Korea Research Institute of Standards and Science,K-MAC
- 当前专利权人： Korea Research Institute of Standards and Science,K-MAC
- 当前专利权人地址： KR Daejeon KR Daejeon
- 代理机构： Clark & Brody
- 优先权： KR10-2006-0056275 20060622
- 国际申请： PCT/KR2007/002992 WO 20070620
- 国际公布： WO2007/148918 WO 20071227
- 主分类号： G01J4/00
- IPC分类号： G01J4/00
摘要：
The present invention relates to an ellipsometer, and more particularly, to an ellipsometer to find out the optical properties of the sample by analyzing the variation of the polarization of a light which has specific polarisation then reflected on a surface of the sample.
公开/授权文献
- US20100045985A1 Focused-beam ellipsometer 公开/授权日：2010-02-25
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