Invention Grant
- Patent Title: PDP filter and manufacturing method thereof
- Patent Title (中): PDP滤波器及其制造方法
-
Application No.: US11794683Application Date: 2006-03-03
-
Publication No.: US08004763B2Publication Date: 2011-08-23
- Inventor: Dong-Wook Lee , Yeon-Keun Lee , In-Seok Hwang , Seung-Wook Kim , Sang-Hyun Park , Jung-Doo Kim , Hyun-Seok Choi , Su-Rim Lee
- Applicant: Dong-Wook Lee , Yeon-Keun Lee , In-Seok Hwang , Seung-Wook Kim , Sang-Hyun Park , Jung-Doo Kim , Hyun-Seok Choi , Su-Rim Lee
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2005-0018294 20050304; KR10-2005-0032392 20050419
- International Application: PCT/KR2006/000749 WO 20060303
- International Announcement: WO2006/115325 WO 20061102
- Main IPC: G02B1/10
- IPC: G02B1/10
Abstract:
Disclosed herein is a PDP filter having a laminated structure of a transparent conductive film type electromagnetic wave-shielding layer and one or more other functional layers, in which at least two edge portions of the surface of the transparent conductive film type electromagnetic wave-shielding layer, which is in contact with the functional layer, are not exposed outside the laminated structure of the PDP filter.
Public/Granted literature
- US20090268298A1 Pdp filter and manufacturing method thereof Public/Granted day:2009-10-29
Information query
