Invention Grant
US08007988B2 Method for manufacturing lens forming master and method for manufacturing thin film transistor substrate using the same
有权
用于制造透镜成形母版的方法和使用其制造薄膜晶体管基板的方法
- Patent Title: Method for manufacturing lens forming master and method for manufacturing thin film transistor substrate using the same
- Patent Title (中): 用于制造透镜成形母版的方法和使用其制造薄膜晶体管基板的方法
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Application No.: US12034983Application Date: 2008-02-21
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Publication No.: US08007988B2Publication Date: 2011-08-30
- Inventor: Jung-Mok Bae
- Applicant: Jung-Mok Bae
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2007-0040811 20070426
- Main IPC: G02F1/1335
- IPC: G02F1/1335
Abstract:
A method for manufacturing a lens forming master includes coating an organic insulation material on a substrate to form an organic insulation layer, removing a portion of the organic insulation layer with a laser which is irradiated through a first mask to form a lens shape on a surface of the organic insulation layer, and removing portions of the organic insulation layer with a laser irradiated through a second mask to form a contact hole and a bank area in the organic insulation layer.
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