发明授权
US08008739B2 Microelectromechanical apparatus and method for producing the same 有权
微机电装置及其制造方法

  • 专利标题: Microelectromechanical apparatus and method for producing the same
  • 专利标题(中): 微机电装置及其制造方法
  • 申请号: US12159356
    申请日: 2006-12-26
  • 公开(公告)号: US08008739B2
    公开(公告)日: 2011-08-30
  • 发明人: Itaru Ishii
  • 申请人: Itaru Ishii
  • 申请人地址: JP Kyoto
  • 专利权人: Kyocera Corporation
  • 当前专利权人: Kyocera Corporation
  • 当前专利权人地址: JP Kyoto
  • 代理机构: DLA Piper LLP (US)
  • 优先权: JP2005-371519 20051226
  • 国际申请: PCT/JP2006/325979 WO 20061226
  • 国际公布: WO2007/074846 WO 20070705
  • 主分类号: H01L29/84
  • IPC分类号: H01L29/84
Microelectromechanical apparatus and method for producing the same
摘要:
A microelectromechanical apparatus (X) includes a microelectromechanical component (10), an insulating substrate (21), a through via (22c) disposed in the insulating substrate (21), a sealing member (30) and a conductive connecting member (40). The microelectromechanical device (10) has a semiconductor substrate (11), a microelectromechanical system (12) and an electrode (13) electrically connected to the microelectromechanical system (12). The sealing member (30) is made of glass, is disposed so as to enclose the microelectromechanical system (12) between the semiconductor substrate (11) and the insulating substrate (21), and hermetically seals the microelectromechanical system (12). The conductive connecting member (40) electrically connects the electrode (13) and an end of the through via (22c), at a position spaced away from the sealing member (30).
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