发明授权
- 专利标题: Imprint lithography
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申请号: US11364497申请日: 2006-03-01
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公开(公告)号: US08011915B2公开(公告)日: 2011-09-06
- 发明人: Klaus Simon
- 申请人: Klaus Simon
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: B29C59/02
- IPC分类号: B29C59/02
摘要:
A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
公开/授权文献
- US20070102838A1 Imprint lithography 公开/授权日:2007-05-10
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