发明授权
- 专利标题: Nonvolatile storage device and method for manufacturing same
- 专利标题(中): 非易失存储装置及其制造方法
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申请号: US12408510申请日: 2009-03-20
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公开(公告)号: US08013317B2公开(公告)日: 2011-09-06
- 发明人: Masahiro Kiyotoshi
- 申请人: Masahiro Kiyotoshi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JP2008-131200 20080519
- 主分类号: H01L29/02
- IPC分类号: H01L29/02
摘要:
A nonvolatile storage device having a plurality of unit memory layers, and a plurality of layer selection transistors is provided. The plurality of unit memory layers are laminated in a direction perpendicular to a layer surface of the unit memory layers. Each of the unit memory layers includes a plurality of first wirings, a plurality of second wirings provided non-parallel to the plurality of first wirings, and a recording layer provided between the plurality of first wirings and the plurality of second wirings. The plurality of layer selection transistors are connected to at least one of the plurality of first wirings and the plurality of second wirings of each of the unit memory layers, and collectively selects the at least one in the same plane.
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