发明授权
- 专利标题: Process and a device to clean substrates
- 专利标题(中): 工艺和清洁基材的设备
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申请号: US12867261申请日: 2009-01-27
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公开(公告)号: US08016949B2公开(公告)日: 2011-09-13
- 发明人: Suresh Sambamurthy Jayaraman , Kirtan Shravan Kamkar , Lalit Kumar , Amit Sah , Rudra Saurabh Shresth
- 申请人: Suresh Sambamurthy Jayaraman , Kirtan Shravan Kamkar , Lalit Kumar , Amit Sah , Rudra Saurabh Shresth
- 申请人地址: US NJ Englewood Cliffs
- 专利权人: Conopco Inc.
- 当前专利权人: Conopco Inc.
- 当前专利权人地址: US NJ Englewood Cliffs
- 代理机构: Rimma Mitelman
- 优先权: IN0373/MUM/2008 20080221
- 国际申请: PCT/EP2009/050869 WO 20090127
- 国际公布: WO2009/103595 WO 20090827
- 主分类号: B08B3/02
- IPC分类号: B08B3/02
摘要:
In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90% volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device.
公开/授权文献
- US20100307541A1 PROCESS AND A DEVICE TO CLEAN SUBSTRATES 公开/授权日:2010-12-09
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