发明授权
- 专利标题: Electrochemical deposition method for surface metallization
- 专利标题(中): 电化学沉积法用于表面金属化
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申请号: US12061648申请日: 2008-04-03
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公开(公告)号: US08016995B2公开(公告)日: 2011-09-13
- 发明人: Kai-Chung Hou
- 申请人: Kai-Chung Hou
- 申请人地址: TW Taipei
- 专利权人: Lite-On Technology Corporation
- 当前专利权人: Lite-On Technology Corporation
- 当前专利权人地址: TW Taipei
- 代理机构: Li & Cai Intellectual Property (USA) Office
- 优先权: TW96144373A 20071123
- 主分类号: C25D1/00
- IPC分类号: C25D1/00
摘要:
An electrochemical deposition method includes disposing a mold into an electrolytic bath for forming a first metal layer on a surface of the mold, bonding a first surface of a conductive component to the first metal layer, and disposing the mold bonded to the conductive component into an electrolytic bath for forming a second metal layer on a second surface of the conductive component.
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