发明授权
US08017700B2 Polycarbosilane, method for producing same, silica composition for coating application, and silica film
有权
聚碳硅烷，其制造方法，涂布用二氧化硅组合物和二氧化硅膜
- 专利标题： Polycarbosilane, method for producing same, silica composition for coating application, and silica film
- 专利标题（中）： 聚碳硅烷，其制造方法，涂布用二氧化硅组合物和二氧化硅膜
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申请号： US12093254申请日： 2006-10-24
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公开(公告)号： US08017700B2公开(公告)日： 2011-09-13
- 发明人: Hisashi Nakagawa , Masahiro Akiyama , Tsuyoshi Furukawa , Naohisa Tokushige
- 申请人： Hisashi Nakagawa , Masahiro Akiyama , Tsuyoshi Furukawa , Naohisa Tokushige
- 申请人地址： JP Tokyo
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2005-327758 20051111; JP2005-327759 20051111
- 国际申请： PCT/JP2006/321148 WO 20061024
- 国际公布： WO2007/055097 WO 20070518
- 主分类号： C08G77/12
- IPC分类号： C08G77/12
摘要：
A polycarbosilane has a main chain in which silicon atoms and carbon atoms are alternately repeated, and includes a structural unit shown by the following general formula (1), a structural unit shown by the following general formula (2), a structural unit shown by the following general formula (3), and a structural unit shown by the following general formula (4).
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